ALEXANDRIA, Va., July 15 -- United States Patent no. 12,662,738, issued on June 23, was assigned to Atotech Deutschland GmbH & Co. KG (Berlin).
"Composition for depositing a palladium coating on a substrate" was invented by Donny Lautan (Berlin), Dimitri Voloshyn (Berlin), Isabel-Roda Hirsekorn (Berlin) and Dirk Tews (Berlin).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention is directed to a composition for depositing a palladium coating on an activated copper-coated substrate, the composition comprising: (i) palladium ions, (ii) chloride ions, (iii) ethylenediamine (EDA), (iv) ethylenediamine disuccinate (EDDS), and (v) at least one reducing agent,wherein the composition has a pH in a rang...