US Patent Issued to ASML NETHERLANDS on Sept. 9 for "Method for rule-based retargeting of target pattern" (California Inventor)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,411,422, issued on Sept. 9, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method for rule-based retargeting of target pattern" was invented by Ayman Hamouda (Milpitas, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for generating a retargeted pattern for a target pattern to be printed on a substrate. The method includes obtaining (i) the target pattern comprising at least one feature, the at least one feature having geometry including a first dimension and a second dimension, and (ii) a plurality of biasing rules defined as a function of the first dimension, the second dimension, and a property associated with feature...