US Patent Issued to ASML Netherlands on Sept. 8 for "Metrology method and apparatus" (Dutch Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,730,388, issued on Sept. 8, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Metrology method and apparatus" was invented by Guido De Haan (Amsterdam), Stephen Edward (Eindhoven, Netherlands), Thomas Jan Van Den Hooven (Amsterdam), Paulus Clemens Maria Planken (Jaarsveld, Netherlands) and Irwan Dani Setija (Utrecht, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a method for measuring a target located on a substrate beneath at least one layer. The method comprises exciting said at least one layer with pump radiation comprising at least one pump wavelength, so as to generate an acoustic wave within said at least o...