US Patent Issued to ASML Netherlands on Sept. 8 for "Light sources and methods of controlling devices and methods for use in measurement applications" (Dutch, British, German Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,730,384, issued on Sept. 8, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Light sources and methods of controlling devices and methods for use in measurement applications" was invented by Marinus Petrus Reijnders (Eindhoven, Netherlands), Hendrik Sabert (London) and Patrick Sebastian Uebel (Marloffstein, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are light sources and methods of controlling them, and devices and methods for use in measurement applications, particularly in metrology, for example in a lithographic apparatus. The methods and devices provide mechanisms for detection and/or correction of variations in ...