ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,748,354, issued on Sept. 29, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).
"Overlay measurement using balanced capacity targets" was invented by Henricus Petrus Maria Pellemans (Veldhoven, Netherlands) and Benoit Herve Gaury (Eindhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method of determining an overlay measurement of a substrate includes: injecting charge into a charge injection element of the substrate; determining a first capacitance of a first pair of elements and a second capacitance of a second pair of elements; and determining a capacitance ratio based on the first capacitance and the second capacitanc...