US Patent Issued to ASML NETHERLANDS on Sept. 22 for "Systems and methods for inspecting a portion of a lithography apparatus" (Connecticut Inventor)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,031, issued on Sept. 22, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Systems and methods for inspecting a portion of a lithography apparatus" was invented by Naveen Kumar Sankaran (Norwalk, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An inspection system includes a body that is configured to be inserted into a lithography apparatus, to be engaged by a tool handler of the lithography apparatus, and to be used for inspecting a portion of the lithography apparatus. A sensor is coupled to the body, and configured to obtain an image of the portion of the lithography apparatus when the body is positioned by the tool handler....