US Patent Issued to ASML Netherlands on Sept. 22 for "System and method for inspection by deflector control in a charged particle system" (California Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,744,178, issued on Sept. 22, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"System and method for inspection by deflector control in a charged particle system" was invented by Datong Zhang (Milpitas, Calif.), Chih-hung Wang (San Jose, Calif.), Oliver Desmond Patterson (San Jose, Calif.) and Xiaohu Tang (Pleasanton, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Apparatuses, systems, and methods for providing beams for using deflector control to control charging on a sample surface of charged particle beam systems. In some embodiments, a controller including circuitry configured to scan a plurality of nodes of the sample to char...