US Patent Issued to ASML NETHERLANDS on Sept. 22 for "Method for determining a focus actuation profile for one or more actuators of a lithographic exposure apparatus" (Dutch, Belgian Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,034, issued on Sept. 22, was assigned to ASML NETHERLANDS (Veldhoven, Netherlands).

"Method for determining a focus actuation profile for one or more actuators of a lithographic exposure apparatus" was invented by Simon Hendrik Celine Van Gorp (Oud-Turnhout, Belgium) and Stephan Van Reenen (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for determining a focus actuation profile for one or more actuators of a lithographic exposure apparatus in control of a lithographic exposure process for exposure of an exposure area including at least two topographical levels. The method includes determining a continuous single focu...