US Patent Issued to ASML NETHERLANDS on Sept. 22 for "Electron beam apparatus, inspection tool and inspection method" (Dutch Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,744,181, issued on Sept. 22, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Electron beam apparatus, inspection tool and inspection method" was invented by Erwin Paul Smakman (Eindhoven, Netherlands), Albertus Victor Gerardus Mangnus (Eindhoven, Netherlands) and Maikel Robert Goosen (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "An electron beam apparatus including: an electron beam source configured to generate an electron beam; a beam conversion unit including an aperture array configured to generate a plurality of beamlets from the electron beam, and a deflector unit configured to deflect one or more groups ...