US Patent Issued to ASML Netherlands on Sept. 15 for "Source material delivery system, EUV radiation system, lithographic apparatus, and methods thereof" (California Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,739,961, issued on Sept. 15, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Source material delivery system, EUV radiation system, lithographic apparatus, and methods thereof" was invented by Pooriya Beyhaghi (San Diego), Charles Edward Kinney (Encinitas, Calif.), Bob Rollinger (San Diego) and Joshua Mark Lukens (San Diego).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes ejecting initial droplets of a material using a nozzle. The method includes applying a pressure on the nozzle using an electromechanical element. The method includes controlling the applied pressure on the nozzle using an electrical signal generated by...