US Patent Issued to ASML Netherlands on Sept. 15 for "Beam position displacement correction in charged particle inspection" (Dutch, Belgian, American Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,445, issued on Sept. 15, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Beam position displacement correction in charged particle inspection" was invented by Martin Frans Pierre Smeets (Veldhoven, Netherlands), Niels Johannes Maria Bosch (Eindhoven, Netherlands), Willem Petrus Van Aaken (Mierlo, Netherlands), Jef Goossens (Bocholt, Belgium), Te-Yu Chen (San Jose, Calif.) and Funda Sahin (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and system for correcting inspection image error are disclosed. The method includes acquiring a set of first beam positions on a test wafer while a wafer stage supporti...