US Patent Issued to ASML Netherlands on Oct. 27 for "Method and system for anomaly-based defect inspection" (California Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,776,025, issued on Oct. 27, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Method and system for anomaly-based defect inspection" was invented by Haoyi Liang (Sunnyvale, Calif.), Yani Chen (San Jose, Calif.), Ming-Yang Yang (Milpitas, Calif.), Yang Yang (Fremont, Calif.), Xiaoxia Huang (Fremont, Calif.), Zhichao Chen (San Jose, Calif.), Liangjiang Yu (Pleasanton, Calif.), Zhe Wang (Dublin, Calif.) and Lingling Pu (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods for detecting a defect on a sample include receiving a first image and a second image associated with the first image; determining, using a c...