ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,831, issued on Nov. 3, was assigned to ASML Netherlands B.V. (Veldhoven., Netherlands).
"Optical apparatus" was invented by Debashis De Munshi (Veldhoven, Netherlands) and Joeri De Bruijckere (Eindhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "An optical apparatus for a reticle stage of a lithographic apparatus is disclosed. The optical apparatus comprises: a reflective optical element comprising a surface for exposure to radiation; at least two electrodes located at the surface; and a measurement system configured to measure one or more electrical characteristics of the reflective optical element between the at least two electrode...