US Patent Issued to ASML NETHERLANDS on Nov. 3 for "Multiple off-axis illumination beams for wafer alignment sensor" (Connecticut Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,834, issued on Nov. 3, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Multiple off-axis illumination beams for wafer alignment sensor" was invented by Kirill Urievich Sobolev (Brookfield, Conn.) and Krishanu Shome (Cheshire, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A novel approach for an alignment system by using glass plates to create off-axis illumination beams is described. A pair of glass plates is inserted into an alignment system to create a pair of off-axis illumination beams. The off-axis illumination beams pass through an aperture stop. A transmissive optic with a plurality of fully reflective mirrors reflects ...