ALEXANDRIA, Va., Nov. 3 -- United States Patent no. RE51,107, issued on Nov. 3, was assigned to ASML NETHERLANDS (Veldhoven, Netherlands).

"Multi-beam inspection methods and systems" was invented by Pieter Willem Herman De Jager (Middelbeers, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems, methods, and programming are described for inspecting a substrate having a pattern imaged thereon, including obtaining a plurality of selected target locations on the substrate, the selected target locations dependent on characteristics of the pattern, scanning the substrate with a plurality of electron beamlets, wherein the scanning includes individually addressing the beamlets to impinge on the select...