US Patent Issued to ASML NETHERLANDS on March 31 for "Method for adjusting a patterning process" (Dutch, Chinese, American Inventors)

ALEXANDRIA, Va., March 31 -- United States Patent no. 12,591,178, issued on March 31, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method for adjusting a patterning process" was invented by Satej Subhash Khedekar (Veldhoven, Netherlands), Henricus Jozef Castelijns (Hapert, Netherlands), Anjan Prasad Gantapara (Veldhoven, Netherlands), Stephen Henry Bond (Eijsden, Netherlands), Seyed Iman Mossavat (Waalre, Netherlands), Alexander Ypma (Veldhoven, Netherlands), Gerald Dicker (Sint-Oedenrode, Netherlands), Ewout Klaas Steinmeier (Waalre, Netherlands), Chaoqun Guo (Shenzhen, China), Chenxi Lin (Newark, Calif.), Hongwei Chen (Shenzhen, China), Zhaoze Li (Shenzhen, China), Youping Zhang (Cupertino, Calif.), Yi Zou (Foster Cit...