US Patent Issued to ASML NETHERLANDS on March 3 for "Fluid handling system, method and lithographic apparatus" (Dutch, Belgian Inventors)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,566,382, issued on March 3, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Fluid handling system, method and lithographic apparatus" was invented by Christianus Wilhelmus Johannes Berendsen (Veldhoven, Netherlands), Theodorus Wilhelmus Polet (Geldrop, Netherlands), Erik Henricus Egidius Catharina Eummelen (Veldhoven, Netherlands), Giovanni Luca Gattobigio (Eindhoven, Netherlands) and Koen Cuypers (Lommel, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "A fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a...