US Patent Issued to ASML NETHERLANDS on March 3 for "Dark field digital holographic microscope and associated metrology method" (Dutch, American Inventors)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,566,406, issued on March 3, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Dark field digital holographic microscope and associated metrology method" was invented by Nitesh Pandey (San Jose, Calif.), Arie Jeffrey Den Boef (Waalre, Netherlands), Hugo Augustinus Joseph Cramer (Eindhoven, Netherlands) and Vasco Tomas Tenner (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A dark field digital holographic microscope and associated metrology method is disclosed which is configured to determine a characteristic of interest of a structure. The dark field digital holographic microscope includes an illumination branch for ...