US Patent Issued to ASML NETHERLANDS on March 24 for "Method and apparatus for controlling a computing process" (American, Chinese Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,585,196, issued on March 24, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method and apparatus for controlling a computing process" was invented by Yen-Wen Lu (Saratoga, Calif.), Xiaorui Chen (San Jose, Calif.) and Yang Lin (Shenzhen, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of controlling a computer process for designing or verifying a photolithographic component, the method including building a source tree including nodes of the process, including dependency relationships among the nodes, defining, for some nodes, at least two different process conditions, expanding the source tree to form an expanded tree, in...