US Patent Issued to ASML Netherlands on March 17 for "Systems, methods, and devices for thermal conditioning of reticles in lithographic apparatuses" (Dutch, Belgian, American Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,578,658, issued on March 17, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Systems, methods, and devices for thermal conditioning of reticles in lithographic apparatuses" was invented by Jean-Philippe Xavier Van Damme (Wezembeek-Oppem, Belgium), Richard John Johnson (Redding, Conn.) and Raaja Ganapathy Subramanian (Maarheeze, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments herein describe systems, methods, and devices for thermal conditioning of patterning devices at a litho-graphic apparatus. A patterning device cooling system for thermally conditioning a patterning device (202) of a lithographic apparatus is ...