US Patent Issued to ASML Netherlands on June 9 for "Contour extraction method from inspection image in multiple charged-particle beam inspection" (California Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,651,322, issued on June 9, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Contour extraction method from inspection image in multiple charged-particle beam inspection" was invented by Lingling Pu (San Jose, Calif.) and Wei Fang (Milpitas, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An improved apparatus and method for extracting pattern contour information from an inspection image in a multiple charged-particle beam inspection system are disclosed. An improved method for extracting pattern contour information from an inspection image comprises identifying, from an inspection image obtained from a charged-particle beam inspecti...