US Patent Issued to ASML Netherlands on June 30 for "Patterning parameter determination using a charged particle inspection system" (Oregon Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,670,575, issued on June 30, was assigned to ASML Netherlands B.V. (Veldoven, Netherlands).

"Patterning parameter determination using a charged particle inspection system" was invented by Junru Ruan (Beaverton, Ore.) and Haiyan Li (Hillsboro, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of obtaining focus and dose data that requires no special marks and that uses images of in-die features is described. A focus/dose matrix wafer is created. Dimensions such as critical dimension (CD), CD uniformity (CDU), edge placement error (EPE), etc., at in-die locations are measured using a charged particle inspection system having a large field of vie...