US Patent Issued to ASML Netherlands on June 30 for "Method of compensating for an effect of electrode distortion, assessment system" (Dutch Inventor)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,671,053, issued on June 30, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Method of compensating for an effect of electrode distortion, assessment system" was invented by Marco Jan-Jaco Wieland (Delft, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Assessment systems and methods are disclosed. In one arrangement, an effect of electrode distortion in an objective lens array is compensated. An electrode distortion is adjusted by varying an electrostatic field in the objective lens array. The adjustment is such as to compensate for an effect of electrode distortion on sub-beams of a multi-beam impinging on a sample. A sub-bea...