US Patent Issued to ASML Netherlands on June 23 for "Metrology apparatus and metrology methods based on high harmonic generation from a diffractive structure" (Dutch, German Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,370, issued on June 23, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Metrology apparatus and metrology methods based on high harmonic generation from a diffractive structure" was invented by Peter Michael Kraus (Amsterdam), Sylvianne Dorothea Christina Roscam Abbing (Utrecht, Netherlands), Filippo Campi (Amsterdam), ZhuangYan Zhang (Berlin), Petrus Wilhelmus Smorenburg (Veldhoven, Netherlands), Nan Lin (Eindhoven, Netherlands), Stefan Michiel Witte (Hoofddorp, Netherlands) and Arie Jeffrey Den Boef (Waalre, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a metrology apparatus and method for measurement of ...