ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,733, issued on June 23, was assigned to ASML Netherlands B.V. (Veldoven, Netherlands).
"Lithography apparatus with improved stability" was invented by Paulus Albertus Van Hal (Waalre, Netherlands), Diego Millo (Amsterdam), Aleksandar Nikolov Zdravkov (Eindhoven, Netherlands) and Marcus Adrianus Van De Kerkhof (Helmond, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to methods for improving the resistance of lithography substrate holders to corrosion. The present invention also relates to systems comprising lithography substrate holders with improved corrosion resistance, and to methods of fabricating devices...