US Patent Issued to ASML Netherlands on July 7 for "Charged particle apparatus and method" (Dutch Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,676,278, issued on July 7, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Charged particle apparatus and method" was invented by Erwin Slot (Zoetermeer, Netherlands) and Mans Johan Bertil Osterberg (Rijswijk, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A charged particle apparatus, configured to project a charged particle multi-beam toward a sample, comprises: a charged particle source configured to emit a charged particle beam; a light source configured to emit light; and a charged particle-optical device configured to project toward the sample sub-beams of a charged particle multi-beam derived from the charged particle ...