US Patent Issued to ASML NETHERLANDS on July 28 for "Lithographic apparatus and an object positioning system" (Dutch Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. RE50,970, issued on July 28, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Lithographic apparatus and an object positioning system" was invented by Adrianus Hendrik Koevoets (Mierlo, Netherlands), Christianus Wilhelmus Johannes Berendsen (Roermond, Netherlands), Rogier Hendrikus Magdalena Cortie (Ittervoort, Netherlands), Jim Vincent Overkamp (Eindhoven, Netherlands), Patricius Jacobus Neefs (Raamsdonksveer, Netherlands), Putra Saputra (Delft, Netherlands), Ruud Hendrikus Martinus Johannes Bloks (Helmond, Netherlands), Michael Johannes Hendrika Wilhelmina Renders (Eindhoven, Netherlands), Johan Gertrudis Cornelis Kunnen (Weert, Netherlands) and Thibault Simon Mathieu L...