US Patent Issued to ASML Netherlands on July 22 for "Laser system for source material conditioning in an EUV light source" (California Inventors)

ALEXANDRIA, Va., July 23 -- United States Patent no. 12,369,244, issued on July 22, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Laser system for source material conditioning in an EUV light source" was invented by Igor Vladimirovich Fomenkov (San Diego), Yezheng Tao (San Diego) and Robert Jay Rafac (Encinitas, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is an apparatus and a method in which multiple, e.g., two or more pulses from a single laser source are applied to source material prior to application of a main ionizing pulse in which the multiple pulses are generated by a common laser source. The first pulse is directed towards the source material when the source ma...