US Patent Issued to ASML Netherlands on July 14 for "Dark field digital holographic microscope and associated metrology method" (Dutch, American Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,432, issued on July 14, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Dark field digital holographic microscope and associated metrology method" was invented by Willem Marie Julia Marcel Coene (Veldhoven, Netherlands), Arie Jeffrey Den Boef (Waalre, Netherlands), Vasco Tomas Tenner (Eindhoven, Netherlands), Nitesh Pandey (Silicon Valley, Calif.), Christos Messinis (Amsterdam) and Johannes Fitzgerald De Boer (Amstelveen, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A dark field digital holographic microscope is disclosed which is configured to determine a characteristic of interest of a structure. The dark field digit...