ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,537,158, issued on Jan. 27, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Charged particle assessment tool, inspection method" was invented by Marco Jan-Jaco Wieland (Delft, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A multi-beam electron-optical system for a charged-particle assessment tool, the system comprising: a plurality of control lenses, a plurality of objective lenses and a controller. The plurality of control lenses are configured to control a parameter of a respective sub-beam. The plurality of objective lenses are configured to project one of the plurality of charged-particle beams onto a sample. The contro...