US Patent Issued to ASML NETHERLANDS on Jan. 20 for "Machine learning based image generation for model base alignments" (Chinese, American Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,529,966, issued on Jan. 20, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Machine learning based image generation for model base alignments" was invented by Qiang Zhang (Campbell, Calif.), Yunbo Guo (San Jose, Calif.), Yu Cao (Saratoga, Calif.), Jen-Shiang Wang (Sunnyvale, Calif.), Yen-Wen Lu (Saratoga, Calif.), Danwu Chen (Guangdong, China), Pengcheng Yang (Guangdong, China), Haoyi Liang (San Jose, Calif.), Zhichao Chen (San Jose, Calif.) and Lingling Pu (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for training a machine learning model to generate a predicted measured image, the method including obtaining...