US Patent Issued to ASML NETHERLANDS on Jan. 20 for "Fluid handling system, method and lithographic apparatus" (Dutch Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,529,964, issued on Jan. 20, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Fluid handling system, method and lithographic apparatus" was invented by Cornelius Maria Rops (Waalre, Netherlands), Giovanni Luca Gattobigio (Eindhoven, Netherlands), Erik Henricus Egidius Catharina Eummelen (Veldhoven, Netherlands) and Dennis Van Den Berg (Eindhoven, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A fluid handling system for a lithographic apparatus, the fluid handling system configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic ap...