US Patent Issued to ASML NETHERLANDS on Feb. 17 for "Method for improving consistency in mask pattern generation" (California Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,554,915, issued on Feb. 17, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method for improving consistency in mask pattern generation" was invented by Quan Zhang (San Jose, Calif.), Tatung Chow (San Jose, Calif.), Been-Der Chen (Milpitas, Calif.) and Yen-Wen Lu (Saratoga, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of determining a mask pattern for a target pattern to be printed on a substrate. The method includes partitioning a portion of a design layout including the target pattern into a plurality of cells with reference to a given location on the target pattern; assigning a plurality of variables within a partic...