US Patent Issued to ASML Netherlands on Feb. 17 for "Lithographic apparatus, substrate table, and manufacturing method" (Connecticut, New York Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,554,204, issued on Feb. 17, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Lithographic apparatus, substrate table, and manufacturing method" was invented by Hao-Chih Wang (Bronxville, N.Y.), Samira Farsinezhad (Norwalk, Conn.), Sotrios Lyrintzis (Danbury, Conn.) and Keane Michael Levy (Wilton, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes treating a burled surface of an object using radiation or heat and setting parameters of the radiation or heat to effectuate a predetermined surface strength, hardness, roughness, coefficient of friction, chemical resistance, wear resistance, and/or corrosion of the burled su...