US Patent Issued to ASML NETHERLANDS on Feb. 10 for "Positioning system, a lithographic apparatus, a driving force attenuation method, and a device manufacturing method" (Dutch, German Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,546,379, issued on Feb. 10, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Positioning system, a lithographic apparatus, a driving force attenuation method, and a device manufacturing method" was invented by Maarten Hartger Kimman (Veldhoven, Netherlands), Hans Butler (Best, Netherlands), Johannes Petrus Martinus Bernardus Vermeulen (Leende, Netherlands), Stefan Troger (Ulm, Germany), Michael Erath (Dietenheim, Germany) and Philipp Gaida (Aalen, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A positioning system for moving or positioning a moveable object, the system including: a dynamic support system including a reaction mass...