US Patent Issued to ASML NETHERLANDS on Feb. 10 for "Active learning-based defect location identification" (California, Colorado Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,548,141, issued on Feb. 10, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Active learning-based defect location identification" was invented by Chenxi Lin (Newark, Calif.), Yi Zou (Foster City, Calif.), Tanbir Hasan (San Jose, Calif.), Huina Xu (Los Altos, Calif.), Ren-Jay Kou (Cupertino, Calif.), Nabeel Noor Moin (Fort Collins, Colo.) and Kourosh Nafisi (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method and apparatus for identifying locations to be inspected on a substrate is disclosed. A defect location prediction model is trained using a training dataset associated with other substrates to generate a predicti...