US Patent Issued to ASML Netherlands on Dec. 23 for "Systems and methods for focusing charged-particle beams" (California Inventors)

ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,505,974, issued on Dec. 23, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Systems and methods for focusing charged-particle beams" was invented by Ying Luo (San Jose, Calif.), Zhonghua Dong (Sunnyvale, Calif.), Xuehui Yin (Union City, Calif.), Long Di (San Jose, Calif.), Nianpei Deng (Fremont, Calif.), Wei Fang (Milpitas, Calif.), Lingling Pu (San Jose, Calif.), Ruochong Fei (San Jose, Calif.), Bohang Zhu (San Jose, Calif.) and Yu Liu (San Jose, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Systems and methods for irradiating a sample with a charged-particle beam are disclosed. The charged-particle beam system may comprise a s...