US Patent Issued to ASML NETHERLANDS on Dec. 23 for "Method for training or using a process model for determining a pattern in a patterning process" (California Inventors)

ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,505,524, issued on Dec. 23, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method for training or using a process model for determining a pattern in a patterning process" was invented by Ziyang Ma (Mountain View, Calif.), Jin Cheng (Santa Clara, Calif.), Ya Luo (Saratoga, Calif.), Leiwu Zheng (San Jose, Calif.), Xin Guo (Sunnyvale, Calif.), Jen-Shiang Wang (Sunnyvale, Calif.), Yongfa Fan (Sunnyvale, Calif.), Feng Chen (San Jose, Calif.), Yi-Yin Chen (Santa Clara, Calif.), Chenji Zhang (San Jose, Calif.) and Yen-Wen Lu (Saratoga, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for training a patterning process model, the ...