US Patent Issued to ASML Netherlands on Aug. 4 for "Utility stage for photolithographic apparatus and method" (Connecticut Inventors)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,699,328, issued on Aug. 4, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Utility stage for photolithographic apparatus and method" was invented by Keane Michael Levy (Wilton, Conn.) and Amy Ng (Ridgefield, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is an apparatus for and method of using an in-system utility stage to provide service functions for wafer tables and other components in the photolithographic system in which the utility stage can access multiple tools without any need to open an enclosure containing the utility stage and the wafer tables and other components thus increasing throughput and decreasing down...