US Patent Issued to ASML NETHERLANDS on Aug. 4 for "Substrate table, lithographic apparatus, sticker, cover ring and method of operating a lithographic apparatus" (Dutch Inventors)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,699,324, issued on Aug. 4, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Substrate table, lithographic apparatus, sticker, cover ring and method of operating a lithographic apparatus" was invented by Gijs Kramer (Nijmegen, Netherlands), Christianus Wilhelmus Johannes Berendsen (Eindhoven, Netherlands), Stijn Van Pelt (Den Bosch, Netherlands), Marcus Martinus Petrus Adrianus Vermeulen (Leende, Netherlands), Simon Karel Ravensbergen (Veldhoven, Netherlands) and Erik Willem Bogaart (Someren, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate table, for use in an immersion lithographic apparatus, having a support area d...