US Patent Issued to ASML NETHERLANDS on Aug. 26 for "Method and apparatus for forming a patterned layer of material" (Dutch Inventors)

ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,399,428, issued on Aug. 26, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Method and apparatus for forming a patterned layer of material" was invented by Evgenia Kurganova (Nijmegen, Netherlands), Gosse Charles De Vries (Veldhoven, Netherlands), Alexey Olegovich Polyakov (Veldhoven, Netherlands), Jim Vincent Overkamp (Eindhoven, Netherlands), Teis Johan Coenen (Vught, Netherlands), Tamara Druzhinina (Eindhoven, Netherlands), Sonia Castellanos Ortega (Leiden, Netherlands) and Olivier Christian Maurice Lugier (Amsterdam).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods and apparatus for forming a patterned layer of material are dis...