ALEXANDRIA, Va., April 7 -- United States Patent no. 12,597,102, issued on April 7, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).
"Image enhancement in charged particle inspection" was invented by Hairong Lei (San Jose, Calif.) and Wei Fang (Milpitas, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "An improved systems and methods for generating a denoised inspection image are disclosed. An improved method for generating a denoised inspection image comprises acquiring an inspection image; generating a first denoised image by executing a first type denoising algorithm on the inspection image; and generating a second denoised image by executing a second type denoising algorithm on the fi...