US Patent Issued to ASML NETHERLANDS on April 21 for "Metrology methods and apparatuses for lithographic performance parameter evaluation using probability descriptions" (Dutch Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,942, issued on April 21, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands).

"Metrology methods and apparatuses for lithographic performance parameter evaluation using probability descriptions" was invented by Thomas Theeuwes (Veldhoven, Netherlands), Jochem Sebastiaan Wildenberg (Aarle-Rixtel, Netherlands), Lei Zhang (Eindhoven, Netherlands) and Ronald Van Ittersum (Tilburg, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a method of determining a performance parameter or a parameter derived therefrom, the performance parameter being associated with a performance of a lithographic process for forming one or more...