US Patent Issued to ASML Netherlands on April 21 for "Metrology method and associated metrology and lithographic apparatuses" (Dutch Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,946, issued on April 21, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).

"Metrology method and associated metrology and lithographic apparatuses" was invented by Patricius Aloysius Jacobus Tinnemans (Hapert, Netherlands) and Leendert Jan Karssemeijer ('s Hertogenbosch, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a method of determining a substrate deformation metric relating to at least one substrate, the substrate deformation metric describing deformation across the at least one substrate. The method comprises obtaining alignment data relating to measurement of a plurality of structures on said substrate...