ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,984, issued on April 14, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands).
"Metrology method and apparatus" was invented by Arjan Johannes Anton Beukman (Son en Breugel, Netherlands), Omar El Gawhary (Veldhoven, Netherlands), Ilse Van Weperen (Veldhoven, Netherlands) and Pieter Joseph Marie Woltgens (Veldhoven, Netherlands).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a method for measuring alignment on an alignment mark, and associated apparatuses. The method comprises illuminating the alignment mark with illumination comprising at least one wavelength; capturing the scattered radiation scattered from the alignment mark...