US Patent Issued to ASML NETHERLANDS, ASML HOLDING on June 3 for "Substrate holder for use in a lithographic apparatus" (Dutch, Belgian, American Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,321,104, issued on June 3, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands) and ASML HOLDING N.V. (Veldhoven, Netherlands).

"Substrate holder for use in a lithographic apparatus" was invented by Thomas Poiesz (Veldhoven, Netherlands), Coen Hubertus Matheus Baltis (Eindhoven, Netherlands), Abraham Alexander Soethoudt (Eindhoven, Netherlands), Mehmet Ali Akbas (Cheshire, Conn.), Dennis Van Den Berg (Eindhoven, Netherlands), Wouter Vanesch (Lummen, Belgium) and Marcel Maria Cornelius Franciscus Teunissen (Grathem, Netherlands).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate holder, for a lithographic apparatus, having a main body, a ...