US Patent Issued to ASML Holding on Jan. 13 for "Lithographic pre-alignment imaging sensor with build-in coaxial illumination" (Connecticut Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,523,941, issued on Jan. 13, was assigned to ASML Holding N.V. (Veldhoven, Netherlands).

"Lithographic pre-alignment imaging sensor with build-in coaxial illumination" was invented by Yuli Vladimirsky (Weston, Conn.) and Lev Ryzhikov (Norwalk, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A patterning device pre-alignment sensor system is disclosed. The system comprises at least one illumination source configured to provide an incident beam along a normal direction towards a patterning device. The system further comprises an object lens group channel along the normal direction configured to receive a 0th order refracted beam from the patterning de...