US Patent Issued to ASML Holding N.V. & ASML Netherlands on Dec. 23 for "Charge dissipative reticle table cleaning reticle" (New York, Connecticut Inventors)

ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,504,699, issued on Dec. 23, was assigned to ASML Holding N.V. & ASML Netherlands B.V. (Veldhoven, Netherlands).

"Charge dissipative reticle table cleaning reticle" was invented by Pedro Julian Rizo Diago (Chappaqua, N.Y.), George Grigorievich Voevodkin (Ossining, N.Y.) and Earl William Ebert (Oxford, Conn.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A reticle stage cleaning apparatus for a reticle stage in a lithographic apparatus includes a substrate having a frontside and a backside opposite the frontside and a conductive layer disposed on the frontside of the substrate. The conductive layer is configured to contact the reticle stage to dissipate c...