US Patent Issued to ASM IP Holding on Nov. 4 for "Multiple-layer method and system for forming material within a gap" (Belgian, Finnish, American Inventors)

ALEXANDRIA, Va., Nov. 6 -- United States Patent no. 12,463,094, issued on Nov. 4, was assigned to ASM IP Holding B.V. (Almere, Netherlands).

"Multiple-layer method and system for forming material within a gap" was invented by Hannu Huotari (Helsinki), Viljami Pore (Helsinki), Timothee Blanquart (Oud-Heverlee, Belgium), Rene Henricus Jozef Vervuurt (Leuven, Belgium), Charles Dezelah (Helsinki), Giuseppe Alessio Verni (Jodoigne, Belgium), Ren-Jie Chang (Leuven, Belgium), Michael Givens (Oud-Heverlee, Belgium) and Eric James Shero (Phoenix).

According to the abstract* released by the U.S. Patent & Trademark Office: "A multiple-layer method for forming material within a gap on a surface of a substrate is disclosed. An exemplary method include...