ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,787,722, issued on Nov. 3, was assigned to ASM IP Holding B.V. (Almere, Netherlands).
"Method of forming patterned features" was invented by Yoann Tomczak (Leuven, Belgium).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of forming patterned features and structures including the patterned features are disclosed. Exemplary methods include selectively forming a surface energy modified surface on a sidewall of structures and/or forming a surface-energy tunable layer on a surface of the substrate. The surface energy modified surface can be formed by depositing material and/or by treating the sidewall surface and/or by treating a surface adjacent the si...